Suzhou Sunwell New Energy Co., Ltd.

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Batch-type RCA Cleaning Equipment

product description

Equipment Application
1.Used for wrap around removal & cleaning of the diffused silicon wafers.
2.Wafer thickness down to 110μm.
3.With dry clean area and self-cleaning system.
4.Quick inline bath change.
5.Available with MES, RFID system, inline weight testing optional.
6.Internal circulation and bubbling, Liquid level and Temperature protection function.

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CONTACT INFORMATION

info@sunwellpower.com

Company Headquarters Address:

Building 2, Phase III , Wuzhong Fumin Industrial Zone ,

Suzhou , Jiangsu

Company Branch address：

No .98-12 Lianyi Road , Luzhi Town , Suzhou , Jiangsu

手机导航显示--勿删勿改

手机导航显示--勿删勿改

Time of issue:2022-04-15 11:14:24

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