Batch-type Mono-crystalline Texturing Equipment
product description
Equipment Application
Used for texturing& cleaning of mono crystalline wafers.
Process bath circulation volume adjustable.
Uniform pyramids texture, etch depth adjustable.
Wafer thickness handling capability up to 110μm.
With clean dry area and self-clean dry system.
Internal circulation and bubbling, Liquid level and Temperature protection function.
6.Quick inline bath change.
Available with MES, RFID system, inline weight testing optional.
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手机导航显示--勿删勿改
手机导航显示--勿删勿改
Time of issue:2022-04-15 11:14:24
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